• (1) STYLUS PROFILER
    Dektak XT

    The Dektak XT™ stylus profiler features a revolutionary design that enables unmatched repeatability of four angstroms (4Å) and up to 40% improved scanning speeds.

    This major milestone in stylus profiler performance is the culmination of forty years of Dektak brand innovation and industry leadership. The remarkable breakthroughs incorporated in this tenth-generation Dektak system enable the critical nanometer-level film, step and surface measurements that will power future advances in the microelectronics, semiconductor, solar, high-brightness LED, medical, scientific and materials science markets.

    Building on the knowledge and experience from more than forty years of stylus profiling innovations, the Dektak XT incorporates a powerful combination of industry firsts, including a unique single-arch design and smart electronics for unmatched repeatability and performance, HD true color camera for enhanced image resolution and clarity, and a 64-bit parallel processing software architecture.

    Unmatched performance and better than 4Å repeatability
    The Dektak XT features an innovative single-arch design that delivers breakthrough platform stability. This is combined with leading-edge "smart electronics" that establish a new low-noise benchmark for stylus profiling. Finally, the Dektak XT’s new hardware configuration offers 40% shorter collection times than prior generations.

    Unprecedented efficiency and ease of use
    The Dektak XT is equipped with Bruker’s intuitive Vision64™ user interface, which simplifies workflow and operation to make the profiler easier than ever to use for advanced analysis. In addition, the system’s self-aligning styli enables effortless tip exchange, while the profiler’s single sensor design enables the widest range of capabilities in a single platform.

    Incomparable value from the world leader in stylus profilers
    In addition to premier performance in an affordable package, the Dektak XT is available with the full complement of accessories to extend versatility and tailor the system to your specific application.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/stylus-profilometers/dektak-xt/overview.html

  • (2) STYLUS PROFILER / LARGE SAMPLE
    Dektak XTL

    The new Dektak XTL™ stylus profiler provides extremely accurate, repeatable, and reproducible metrology for a wide range of applications. With its ability to accommodate samples up to 350mm x 350mm, this system finally brings legendary Dektak performance to 200mm and 300mm wafer manufacturing.

    The Dektak XTL features a small footprint and integrated isolation with interlocking doors, making it ideal for today's demanding production floor environments. Its dual-camera architecture enables enhanced spatial awareness, and its high level of automation enhances manufacturing throughput. Bruker's exclusive Vision64 advanced production interface with optional pattern recognition makes data collection an intuitive and repeatable process, and minimizes operator-to-operator variability.

    With its unique combination of superior performance and ease of use the Dektak XTL is the new standard for industrial thin film deposition monitoring in touch-panel, solar, flat panel display and semiconductor industries for research and QA/QC.

    Analyzes large samples
    • Encoded 300mm X/Y stage
    • Accommodates 200 & 300mm wafers
    • Up to 350mm x 350mm panels

    Industrial design
    • Integrated isolation platform
    • Incorporated keyboard/monitor
    • Small footprint workstation

    Optimized features for QA/QC
    • Pattern recognition
    • Advanced production interface
    • Interlocked doors
    • Localized GUI
    • Auto-ready kit for SECS/GEM

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/stylus-profilometers/dektak-xtl/overview.html

  • AUGER ELECTRON SPECTROSCOPY (AES) / SURFACE ANALYSIS / SPECTRAL ANALYSIS
    PHI 710

    Auger Electron Spectroscopy (AES, Auger) is an analytical technique that provides compositional and distributional information of elements on the top few monolayers of a material by irradiating an electron beam to the surface of a solid material and measuring the energy of Auger electron emitted from the sample surface. The PHI 710 Scanning Auger Nanoprobe is a high performance surface analysis system that provides nanometer level Auger analysis. The acoustic enclosure and the built-in vibration isolators allow compositional and distributional measurement by 500,000 magnification that conventional Auger system never achieved.

  • LASER CONFOCAL MICROSCOPE / NON-DESTRUCTIVE
    LEXT OLS4100

    The LEXT OLS4100 is a Laser Scanning Microscope to perform non-contact 3D observations and measurements of surface features at 10 nanometer resolutions. It also features a fast image acquisition and a high-resolution image over a wider area.

  • SIMS / ToF
    MiniSims

    The MiniSIMS ToF has a superior level of performance for probing the unknown, investigating smaller surface features and extracting more information from organic samples. The implementation of a time-of flight (ToF) mass spectrometer therefore takes the MiniSIMS concept to a new level of performance by providing spot analysis, imaging, and depth profiling in one compact, easy to use package. The hyperspectral imaging capability of the MiniSIMS-ToF combined with efficient depth profiling allow complete 3D spatial pixel arrays with full or partial mass spectra at every pixel to be acquired. In this way a very comprehensive picture of the surface and sub surface chemistry of solid samples can be acquired with minimal setup and analyzed retrospectively.

  • TOF-SIMS / SURFACE ANALYSIS
    PHI nanoTOF II

    Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS) is a surface analysis technique that provides compositions and images of surface molecules and elements with a top few atmic layers. TOF-SIMS can analyze from H+ to high mass number molecule ion (> 10.000amu) with a high mass resolution.
    PHI TRIFT V nanoTOF ™ achieves high spatial resolution and mass resolution by using triple focus hemispherical electrostatic analyzer which has excellent ion transmitting characteristics.PHI TRIFT V nanoTOF ™ also has high ability that can image samples with complex geometries without shadowing.

  • XPS / SURFACE ANALYSIS / AUTOMATED
    PHI Quanterra II

    The Quantera II is the next generation of PHI’s highly successful scanning XPS microprobe product line. The Quantera II provides high sensitivity large and micro-area spectroscopy, superior inorganic and organic depth profiling, and the fully automated analysis of insulating or conductive samples.

    Important features of the Quantera II include:
    High sensitivity large area spectroscopy
    High performance micro-area spectroscoy
    Patented scanning x-ray source with a < 7.5 µm minimum beam size
    Secondary electron and XPS imaging
    Highest performance inorganic and organic sputter depth profiling
    Optional C 60 sputter ion gun
    Hands-off dual beam charge neutralization
    Robust ""Auto-Z"" sample alignment
    Robotic sample handling
    Fully automated and internet ready for remote operation
    Micro area spectroscopy and high performance thin film analysis capabilities open new areas of application for XPS surface analysis in all environments. The complete automation of the system makes it easy to use and increases the reproducibility of routine measurements. Large sample platens make it possible to analyze “real world” large samples or multiple small samples automatically. A new generation of XPS surface analysis instruments are available today from PHI.

  • XPS / SURFACE ANALYSIS / MID-RANGE
    PHI X-Tool

    The PHI X-tool is the newest member of PHI’s suite of XPS instruments that also includes the PHI Quantera II and PHI VersaProbe II. The X-tool is designed to make XPS instrumentation accessible to a larger audience. An intuitive touch screen user interface, automatic sample loading, automatic analysis, and automatic report generation removes the requirement to be a surface analysis expert to perform XPS measurements.

    Based on PHI’s patented scanning XPS microprobe technology, the X-tool provides a robust environment for performing routine small and large area XPS measurements.

    In the automatic mode of operation a turnkey recipe driven analysis capability for repetitive analysis tasks or process monitoring is provided.

    In the interactive mode of operation, the user can define analysis conditions and guide an interactive research or failure analysis oriented analysis session. Analysis capabilities include: small and large area spectroscopy, XPS mapping, and sputter depth profiling. An internal optical microscope and x-ray beam induced secondary electron imaging are available to guide the selection of areas for analysis.

    If your XPS application is centered around repetitive analysis tasks or the need to make XPS available to a large group of users, the X-tool was designed for you.

  • XPS / SURFACE ANALYSIS / MULTI-TECHNIQUE
    PHI VersaProbe II

    The VersaProbe II is the next generation of PHI's highly successful Multi-Technique Scanning XPS Microprobe, which features a new software user interface for instrument operation and a new 128 channel detector. The VersaProbe II is based on PHI’s scanning x-ray microprobe technology, that provides high performance XPS large area spectroscopy, superior micro-area spectroscopy, chemical imaging, and secondary electron imaging with a raster scanned 10 µm diameter x-ray beam.

    PHI’s innovative and patented dual beam charge neutralization method provides turn-key analysis of insulating samples using a combination of low energy ions and electrons.

    The integral floating column argon ion gun provides an impressive sputter depth profiling capability for inorganic thin film structures. Optional C60+ and Ar2500+ cluster source ion guns provide a unique and powerful organic sputter depth profiling capability.

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