• (1) AFM / SCANNING MODE / HIGH RESOLUTION
    PeakForce Tapping®

    Bruker’s exclusive PeakForce Tapping® is the most significant scientific breakthrough in atomic force microscope (AFM) technology since the introduction of TappingMode™. It provides unprecedented high-resolution imaging, extends AFM measurements into a range of samples not previously accessed, and uniquely enables simultaneous nanoscale property mapping.

    Highest resolution imaging
    PeakForce Tapping enables the researcher to precisely control probe-to-sample interaction, providing the lowest available imaging forces. This superior force control results in the most consistent, highest resolution AFM imaging for the widest range of sample types, from the softest biological samples to very hard materials.

    Unique, quantitative results, whatever you measure
    PeakForce Tapping’s piconewton (pN) force sensitivity simultaneously and uniquely combines the highest resolution AFM imaging with quantitative, nanoscale electrical, mechanical, biological, and chemical property mapping, enabling researchers of all experience levels to make new discoveries.

    Easy to use, making every user an AFM expert
    PeakForce Tapping’s superior force control provides the user with unmatched AFM ease of use with ScanAsyst® image optimization software, and the low forces preserve the probe shape for longer life and more consistent imaging.

    Featured on the following Bruker AFMs:
    • Dimension FastScan®
    • Dimension FastScan Bio™
    • Dimension Icon®
    • Dimension Icon-Raman™
    • Inspire™
    • BioScope Resolve™
    • MultiMode® 8
    • Dimension Edge™

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/modes/modes/imaging-modes/peakforce-tapping/overview.html

  • (1) STYLUS PROFILER
    Dektak XT

    The Dektak XT™ stylus profiler features a revolutionary design that enables unmatched repeatability of four angstroms (4Å) and up to 40% improved scanning speeds.

    This major milestone in stylus profiler performance is the culmination of forty years of Dektak brand innovation and industry leadership. The remarkable breakthroughs incorporated in this tenth-generation Dektak system enable the critical nanometer-level film, step and surface measurements that will power future advances in the microelectronics, semiconductor, solar, high-brightness LED, medical, scientific and materials science markets.

    Building on the knowledge and experience from more than forty years of stylus profiling innovations, the Dektak XT incorporates a powerful combination of industry firsts, including a unique single-arch design and smart electronics for unmatched repeatability and performance, HD true color camera for enhanced image resolution and clarity, and a 64-bit parallel processing software architecture.

    Unmatched performance and better than 4Å repeatability
    The Dektak XT features an innovative single-arch design that delivers breakthrough platform stability. This is combined with leading-edge "smart electronics" that establish a new low-noise benchmark for stylus profiling. Finally, the Dektak XT’s new hardware configuration offers 40% shorter collection times than prior generations.

    Unprecedented efficiency and ease of use
    The Dektak XT is equipped with Bruker’s intuitive Vision64™ user interface, which simplifies workflow and operation to make the profiler easier than ever to use for advanced analysis. In addition, the system’s self-aligning styli enables effortless tip exchange, while the profiler’s single sensor design enables the widest range of capabilities in a single platform.

    Incomparable value from the world leader in stylus profilers
    In addition to premier performance in an affordable package, the Dektak XT is available with the full complement of accessories to extend versatility and tailor the system to your specific application.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/stylus-profilometers/dektak-xt/overview.html

  • (1) TRIBOLOGY / MECHANICAL TESTING
    UMT TriboLab

    Bruker’s Universal Mechanical Tester (UMT) platform has been the most versatile and widely used tribometer on the market since the first model debuted in 2000. Now, newly designed from the ground up, the UMT TriboLab™ builds on that legacy of versatility with a unique modular concept that harnesses more functionality than ever before—all without any compromise in performance.

    In fact, the UMT TriboLab offers higher speeds, more torque, and better force measurement than any of its predecessors or competitors, plus it introduces powerful new features for improved efficiency and ease-of-use. TriboLab can perform practically every common tribological test on nano and micro scales. Due to its range of testing abilities and multiple possible configurations, it is used extensively across a wide variety of industries, including biomedical, microelectronics, paper, and coatings, and throughout common industrial processes in petroleum, aerospace, automobile, engine, bearing, and fastener manufacturing.

    Today, most instruments available for tribology testing are single-function testers, and none are designed with the same range of versatile modularity as the UMT TriboLab. Within minutes the platform can be transformed from rotary to reciprocating motion, from sub-newton to kilonewton force measurement, or from room temperature up to 1000°C for environmental testing.

    The key element in TriboLab’s new design is a high-performance motor mounted in the center of a proprietary vibration-dampened column. This motor accommodates the full range of speeds and torques. Four interchangeable mechanical drives translate this power into linear and rotary motion to provide a wide selection of rotary, reciprocating, block-on-ring, and linear tribology and scratch-test configurations. With mechanical testers from other manufacturers, this much flexibility would require having multiple testers on site.

    TriboLab can be custom configured to meet your individual real-world testing needs:
    • Selection of versatile modular drives
    • Choice of high-load, high-performance sensors
    • Wide range of temperature and environment accessories

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/tribometers-and-mechanical-testers/umt-tribolab/overview.html

  • (2) AFM / FAST SCAN
    Dimension Fastscan

    The Dimension FastScan® delivers, for the first time, extreme imaging speed without loss of resolution, loss of force control, added complexity, or additional operating costs. This tip-scanning system provides measurements on both large and small size samples in air or fluids. With the FastScan you can achieve immediate atomic force microscopy images with the expected high resolution of a high-performance AFM, all in a single system. Whether surveying a sample scanning at >125Hz to find the region of interest, or scanning for detail at 1-second per image frame in air or fluids, the Dimension FastScan will redefine your AFM experience.

    Enhanced Nanoscale Automation
    Bruker’s new AutoMET™ software uniquely enables the combination of high-resolution AFM imaging with fast, automated metrology. It provides exceptional ease of use and adaptability for critical-to-quality measurements in high-volume measurement applications. AutoMET includes an intuitive and simple recipe-writing environment that makes it extremely easy to reduce complex measurement routines to simple, push-button operations.

    Delivering High Performance on Any AFM Sample
    • Closed-loop Icon and FastScan scanners keep vertical noise below 30pm and 40pm, respectively, as well as high accuracy with ultra-low drift
    • Sample from subnanometer to hundreds of nanometers in height without loss of resolution

    Whether using the Icon scanner with ultra-low noise and high accuracy, or employing the FastScan scanner for high scan rates, the Dimension FastScan system will expand your laboratory’s capabilities beyond that of any other single instrument you can purchase.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/dimension-fastscan/overview.html

  • (2) STYLUS PROFILER / LARGE SAMPLE
    Dektak XTL

    The new Dektak XTL™ stylus profiler provides extremely accurate, repeatable, and reproducible metrology for a wide range of applications. With its ability to accommodate samples up to 350mm x 350mm, this system finally brings legendary Dektak performance to 200mm and 300mm wafer manufacturing.

    The Dektak XTL features a small footprint and integrated isolation with interlocking doors, making it ideal for today's demanding production floor environments. Its dual-camera architecture enables enhanced spatial awareness, and its high level of automation enhances manufacturing throughput. Bruker's exclusive Vision64 advanced production interface with optional pattern recognition makes data collection an intuitive and repeatable process, and minimizes operator-to-operator variability.

    With its unique combination of superior performance and ease of use the Dektak XTL is the new standard for industrial thin film deposition monitoring in touch-panel, solar, flat panel display and semiconductor industries for research and QA/QC.

    Analyzes large samples
    • Encoded 300mm X/Y stage
    • Accommodates 200 & 300mm wafers
    • Up to 350mm x 350mm panels

    Industrial design
    • Integrated isolation platform
    • Incorporated keyboard/monitor
    • Small footprint workstation

    Optimized features for QA/QC
    • Pattern recognition
    • Advanced production interface
    • Interlocked doors
    • Localized GUI
    • Auto-ready kit for SECS/GEM

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/stylus-profilometers/dektak-xtl/overview.html

  • (2) TRIBOLOGY / MECHANICAL TESTING
    NanoForce

    Rapid, Flexible and Highly Accurate Mechanical Testing
    • Decades of design excellence form the foundation for customer-centric, high performance
    • Innovative hardware and software, including ultra-low load capability, dynamic testing, and AFM imaging, ensure highly accurate test results
    • Superior system design includes real-time control of all environmental variables during testing
    • Intrinsic flexibility in an all-inclusive test system—no extra add-ons or accessories to purchase
    • User-friendly software and an intuitive GUI provide a fast, easy path to accurate data

    In the NanoForce™ Nanomechanical Testing System, Bruker has combined the superlative capabilities of its industry-leading micro and nano mechanical testers with the outstanding imaging and nanoscale characterization abilities of atomic force microscopy (AFM).

    NanoForce offers the most advanced technology in quasistatic and dynamic indentation capabilities, plus additional functionality unique to AFM, with the most user-friendly, feature-rich design available in a nanomechanical testing system. This powerful combination results in unprecedented ability from a single tool: high precision demanded for nanoscale investigation along with detailed and accurate nanoscale properties characterization, plus the flexibility, ruggedness, and reliability needed for mechanical testing. With NanoForce you get nanomechanical testing capabilities that go far beyond nanoindentation, enabling real innovations in materials science.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/tribometers-and-mechanical-testers/nanoforce/overview.html

  • (3) AFM / LIFE SCIENCE / FAST SCAN
    Dimension Fastscan Bio

    The Dimension FastScan Bio™ Atomic Force Microscope (AFM) breaks longstanding barriers to provide routine high-resolution research of biological dynamics, with temporal resolution up to 3 frames per second for live sample observations. Furthermore, it does this while making the AFM easier to use than ever before.

    These breakthroughs allow many more researchers to observe and study the mechanisms biomolecular machines utilize to perform their biological functions. FastScan Bio’s high-resolution and high-speed scanning provide the best available bio tool for the observation of molecules, proteins, DNA, RNA, living cell membranes and tissues, and many other dynamics studies.

    Greatest Productivity Seen on Any AFM
    „„• FastScan Bio enables high-speed scanning, in conjunction with a seamless user interface for panning, zooming and continuous tracking of samples in fluid to render faster results.
    „„• A single-scan speed slider facilitates immediate access to scan rate control without the complexity of multiparametric adjustment.
    „„• On-board data and image manipulation tools present final data as high-resolution AFM images or experiment session movies.

    Immediate Path to Data Collection on Live Samples
    • „„Smart Engage algorithms take ambiguity out of the experiment process and provide flexibility for commercially available or custom-made probes.
    „„• User interface controls automate laser and detector alignment with a comprehensive workflow for faster time to data.
    • „„Quick sample engaging and immediate imaging are routine.

    More Options to Optimize Biological AFM Experiments
    „„• Innovative FastScan AFM technology enables high-speed scanning and a seamless user interface to render immediate panning, zooming and continuous tracking of samples in fluid.
    „„• FastScan Bio AFM allows direct visualization of biomolecules with an unprecedented combination of spatial and time resolution.

    For more information, please visit:
    https://www.bruker.com/products/surface-and-dimensional-analysis/atomic-force-microscopes/dimension-fastscan-bio/overview.html

  • (3) TRIBOLOGY / MECHANICAL TESTING / CMP
    Bruker CP-4 CMP

    The new Bruker CP-4 CMP Process and Material Characterization System has been designed from the ground up specifically for reliable, flexible, and cost effective characterization of wafer polishing processes.
    • Reproduces full-scale wafer polishing-process conditions
    • Provides unmatched measurement repeatability and detail
    • Performs tests on small coupons rather than whole wafers for substantial cost savings

    CMP process development for new materials and research into new CMP consumables (pads, slurries, and conditioning disks) are expensive to perform on full-scale production CMP systems. This is due to the combined cost of test wafers, consumables, overhead, depreciation, and lost productivity when running tests instead of production wafers.

    Bruker’s CP-4 provides the flexibility, control and repeatability to perform studies on coupons cut from larger wafers, resulting in substantial savings. Built on the industry-leading UMT TriboLab™ platform, CP-4 offers higher speeds, more torque, and better force measurement for CMP applications than any of its predecessors or competitors.

    The CP-4 system’s accuracy and measurement repeatability enables the highly effective qualification, inspection, and ongoing functionality testing required throughout the CMP process. It’s the only tool on the market that can provide the broad polishing pressure range (0.05-50 psi), speeds (1 to 500 rpm), acoustic emissions, friction, and surface temperature for accurate and complete characterization of CMP processes and consumables.

    On-board diagnostics for better understanding of polishing processes
    • Delivers more visibility into transient polishing properties than any other system on the market
    • Collects data from the instant the substrate touches the pad and throughout the entire test
    • Enables early-stage process development decisions through more complete, detailed data

    Flexibility in sample type, size, and mounting configurations for widest applicability
    • Polishes any flat material, using virtually any conditioning disc, any slurry, and any pad
    • Accommodates small coupons and up to whole 100mm wafers with ease
    • Accepts multiple sample mounts for flexibility

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/tribometers-and-mechanical-testers/cp-4/overview.html

  • (4) AFM / LIFE SCIENCE / FLUORESCENCE
    BioScope Resolve

    The BioScope Resolve™ BioAFM provides the highest resolution imaging, most complete biomechanics capabilities, and fastest scanning of any bioAFM available. Specifically designed for integration onto inverted optical light and confocal microscopes, it enables investigation of a wide range of biological samples, from cells and tissues to molecular and protein structures. The New MIROView™ interface provides unique data sets by combining AFM biomechanics data with real-time confocal and fluorescence microscopy.

    BioScope Resolve's seamless integration of atomic force microscopy and light microscopy reveals more detail and information of biological samples including mechanical properties. The system's unique design makes combined optical and AFM research easy with its open access to the sample, single instrument setup, and correlated data collection and analysis. Researchers can now perfectly connect real-time optical images with AFM imaging.

    The new MIROView graphical interface and ScanAsyst-Cell mode ensure expert data generation, regardless of the user’s AFM experience level. Other features include:
    • Integrates with all major microscope models and optical techniques
    • Single, integrated view and operation controls for AFM or optical microscope
    • Syncronized AFM images, force maps and single force curves with optical images and data
    • Point-and-click setup for automated force and imaging measurements
    • Video creation of experiments showing optical and AFM results
    • BioAFM accessories and PeakForce Tapping probes to meet every application

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/bioscope-resolve/overview.html

  • AFM / AUTOMATION / LARGE SAMPLE
    Dimension Icon

    Icon AFM incorporates the latest evolution of Bruker’s industry-leading nanoscale imaging and characterization technologies on a large sample tip-scanning AFM platform. The Icon’s temperature-compensating position sensors render noise levels in the sub-angstroms range for the Z-axis, and angstroms in X-Y. This level of performance has established the new generation of what Atomic Force Microscopy should be.

    Ultimate Performance
    • Proprietary sensor design achieves closed-loop performance with noise levels for previously unseen on any AFM
    • Significantly reduced noise floor at less than 30pm enabling imaging at sub-nanometer resolution.
    • Drift rates less than 200pm per minute render distortion-free images immediately.

    Enhanced Nanoscale Automation
    Bruker’s new AutoMET™ software uniquely enables the combination of high-resolution AFM imaging with fast, automated metrology. It provides exceptional ease of use and adaptability for critical-to-quality measurements in high-volume measurement applications. AutoMET includes an intuitive and simple recipe-writing environment that makes it extremely easy to reduce complex measurement routines to simple, push-button operations.

    Exceptional Productivity
    • Integrated alignment tools deliver quick and optimized probe positioning.
    • High-resolution camera and X-Y positioning permit faster, more efficient sample navigation.
    • ScanAsyst® Imaging and NanoScope® software with default experiment modes distill decades of knowledge into preconfigured settings.

    Superior Versatility
    • Wide-open access to tip and sample accommodates a large variety of standard and customized experiments.
    • Instrument and software designed to take full advantage of all current and future Bruker AFM modes and techniques.
    • Custom user-programmable scripts offer semi-automated measurement and analysis.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/dimension-icon/overview.html

  • AFM / ENTRY LEVEL
    Innova

    The Innova® Atomic Force Microscope (AFM) delivers accurate, high-resolution imaging and a wide range of functionality for advanced research in physical, life, and material sciences. The system has been engineered to provide an unmatched combination of productivity, ease of use, and application flexibility for the most demanding scientific research, all at a moderate cost.

    It offers a unique, state-of-the-art closed-loop scan linearization system that ensures accurate measurements and noise levels approaching those of open-loop operation. Innova delivers atomic resolution with great ease and scans up to 90 microns without the need to change scanner hardware. The integrated, high-resolution color optics and programmable, motorized Z-stage make finding features and changing tips or samples fast and easy.

    Optimized for Performance
    All aspects of the Innova electromechanical design have been optimized, from the rigid microscope stage with a short mechanical loop and low thermal drift to the ultra-low noise electronics. The result is a unique combination of high-resolution performance and closed-loop positioning. Innova uses Bruker’s proprietary ultra-low noise digital closed-loop scan linearization for accurate measurements in all dimensions, regardless of size, offset, speed, or rotation in air and liquid.

    High-Resolution System
    • Utilizes an innovative design optimized for lowest closed-loop noise and drift
    • Ensures accurate measurements at all scales and in all dimensions
    • Delivers highest resolution results with great ease

    Fast Setup for Every Experiment
    • Provide fastest hardware setup via ergonomic open stage and premounted cantilever option
    • Ensures fast and precise region of interest identification with software-controlled high-NA optics
    • Distills decades of AFM expertise into preconfigured software settings
    • Enables seamless operation from survey to atomic resolution

    Powerful Research Flexibility
    • Addresses all advanced measurements with full range of SPM modes
    • Customizes research with configurable signal access and physical access to tip-sample junction
    • Offers nano-optics with TERS-enabled AFM-Raman integration

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/innova/overview.html

  • AFM / IR / sSNOM
    Inspire

    Bruker’s Inspire™ is a nanoscale characterization system that extends atomic force microscopy (AFM) into the chemical regime by providing infrared absorption and reflection imaging based on scattering scanning near-field optical microscopy—the most powerful technique for identifying composition at the nanoscale. For the first time, Inspire makes 10-nanometer spatial resolution nano IR chemical mapping widely available in an easy-to-use, laser-safe package. Inspire instantly correlates nanochemical information with molecular scale electrical and mechanical measurements that are only possible with PeakForce Tapping®.

    In addition to nanoscale absorption and reflection imaging, Inspire also provides monolayer sensitivity and 10-nanometer lateral resolution, routinely, by employing sSNOM. Inspire succeeds where conventional photothermal approaches fail due to lack of sensitivity and low resolution caused by contact mode imaging. Inspire achieves the highest spatial resolution consistently, from resolving even sub-30-nanometer phase separations in block copolymers to detecting monolayers in layered and 2D materials, such as pentacene, boron nitride, and graphene, to interrogating inorganic crystals and many other materials.

    Inspire is the first laser-safe sSNOM system and the first one that does not require expertise in aligning free-space laser optics. Its IR EasyAlign reduces alignment to pointing and clicking on a new probe position. The interferometer remains aligned, independent of the laser source and probe. An intuitive user interface with complete integration of laser optics and detector control into a linear workflow ensures a fast, successful experiment setup every time. Inspire frees you to focus on your next discovery.

    Alignment is as simple as:
    1. Select laser wavelength
    2. Use IR EasyAlign to find hotspot
    3. Autoset phase

    Easily Customize Your System with Accessories and Options
    Inspire is a highly expandable platform that can grow with your research needs. You can access additional chemistries by adding more tunable lasers at any time. Adding lasers does not require realignment, and switching between lasers takes only minutes.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/inspire/overview.html

  • AFM / LARGE SAMPLE
    Dimension Edge

    Dimension Edge™ leverages the many innovations of the Dimension Icon® System to provide levels of performance and functionality only available from Bruker. At the heart of this system’s capabilities is Bruker’s revolutionary closed-loop scanner, which reduces closed-loop positioning noise levels to the length scale of a single chemical bond.

    The Dimension Edge is equipped with proprietary ScanAsyst® automatic image optimization technology, which enables easier, faster, and more consistent results. Now the most advanced large-sample atomic force microscopy capabilities are available to every facility and user. Designed from top to bottom to deliver the low drift and low noise necessary to achieve publication-ready data in minutes instead of hours, you won’t find a more powerful mid-priced AFM.

    Highest Productivity for Any User
    • Proprietary ScanAsyst imaging enables instant expert results
    • High-resolution, 5MP camera and integrated stage control provide fast sample navigation and efficient multi-site measurments
    • Linear workflow and seamless transition from survey to highest resolution delivers accurate results in a short time

    Best Value Closed-Loop Dimension AFM
    • Proprietary sensor design achieves closed-loop accuracy with open-loop noise levels
    • Significantly reduced noise and drift values bring small-sample imaging performance to a large-sample AFM
    • Modular microscope and electronics design enable high image fidelity at moderate cost

    Solutions for All Applications on Any Sample
    • Open stage access accommodates wide variety of experiments and samples
    • New instrument design and software take full advantage of Bruker's full suite of AFM modes, including advanced electrical and electrochemical applications
    • Built-in access to signal routing enables custom measurements to take research in new directions

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/dimension-edge/overview.html

  • AFM / MATERIALS / FLEXIBLE MODES
    MultiMode 8-HR

    The legendary performance and reliability of the MultiMode platform is the result of both its superior mechanical design and the industry’s lowest noise control electronics. The secret to its continued presence at the leading edge of AFM research is its ability to incorporate all the latest technology advances.

    Faster and More Productive
    • The NEW high-speed ScanAsyst-HR is now available, enabling fast scanning on the MultiMode 8-HR AFM system.
    • 20X faster survey scan rates and up to 6X faster scans with no loss of resolution.

    Versatility to Satisfy More Applications
    • The MultiMode 8-HR AFM is equally well suited for imaging in both air and fluid.
    • Heating to 250°C, cooling to -35°C with temperature control accessories.
    • A large variety of standard operating modes and many unique capabilities enable the MultiMode 8-HR AFM system to characterize everything from mechanical to electrical properties.

    Easier Expert-Quality Results
    • Bruker's proprietary ScanAsyst atomic force microscopy scan technology mode offers automatic image optimization, continuously adjust scan rate, setpoint and gains to obtain the highest quality image and to deliver faster, more consistent results.
    • Imaging in fluid has never been easier with no need for cantilever tuning and with ScanAsyst continuously monitoring the tip-sample interaction force, thereby eliminating setpoint drift.

    Exclusive & Powerful Quantitative Imaging Modes
    • PeakForce QNM enables direct mapping of nanomechanical properties, including elastic modulus, adhesion and dissipation, at high resolution and normal scan rates.
    • PeakForce TUNA™ enables quantitative conductivity mapping on delicate samples that can't be imaged with conventional conductive AFM.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/multimode-8-hr/overview.html

  • AFM / RAMAN / CHEMICAL ANALYSIS
    Dimension Icon-Raman

    With the introduction of integrated Raman spectroscopy capability, Bruker's Dimension Icon® platform again sets a new standard in high-performance surface characterization, enabling colocalized measurements with unsurpassed efficiency and ease.

    The Icon AFM-Raman system brings together the complimentary techniques of atomic force microscopy and Raman microscopy to provide critical information on both the topography and the chemical composition of a sample.

    When these techniques are further enhanced with advanced AFM modes, such as Bruker exclusive PeakForce TUNA™ electrical characterization and PeakForce QNM® quantitative nanomechanical mapping, researchers are able to better understand the mechanisms that lead to specific material properties.

    Key Features
    • Fully integrated system delivers convenient correlation of advanced AFM data with information on chemical composition or crystallographic structure
    • High-resolution X-Y stage permits fast and accurate positioning between the AFM and Raman microscope
    • Full range of AFM capabilities provides more features than any other system
    • PeakForce QNM® enables quantitative nanoscale mechanical property mapping
    „„• Wide-open access to tip and sample accommodates a large variety of standard and customized experiments
    „„• ScanAsyst® enables dramatically more productive imaging with fully automatic parameter optimization, guaranteeing best results on the most delicate samples

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/dimension-icon-raman/overview.html

  • AFM / RAMAN / CHEMICAL ANALYSIS
    Innova-IRIS

    Bruker’s Innova-IRIS (Integrated AFM-Raman Imaging System) enables the emerging technique of tip-enhanced Raman spectroscopy (TERS), seamlessly blending atomic force microscopy and Raman spectroscopy.

    This provides researchers a perfect combination of chemical or crystallographic information at high spatial and spectral resolution with the most advanced atomic force microscopy characterization. The Innova-IRIS can be integrated with your choice of a leading Raman system to provide the best opaque sample TERS investigations available today. However you tailor your system, your application will benefit from Bruker exclusive, high-contrast IRIS TERS probes and the best tip preservation and lowest drift, guaranteeing that alignment is preserved even over the optical integration times necessary to interrogate weak Raman scatterers.

    Easiest to Use AFM for Spectroscopy in Nanostructured Materials
    • Ergonomic hardware and streamlined software with integrated setup diagnostics deliver instant research quality results.
    • Experiment Selector” distills decades of knowledge into preconfigured settings, mitigating the complexity of traditional TERS setups.

    Highest Performance, Most Complete AFM Capabilities
    • Fully featured suite of advanced topographic, electrical, mechanical, and thermal AFM capabilities enables correlated property mapping.
    • System design for noise and drift elimination enables high-resolution imaging and long Raman integration times.

    True Nanoscale Spectroscopy Targeted to Your Application
    • Modular accessories tailor system to targeted applications.
    • Optimized optical access enables capture of weak Raman signals for nanoscale chemical mapping, even on challenging samples.

    The Most Complete TERS Solution
    • Innova-IRIS is compatible with Bruker's new high-contrast IRIS TERS probes, providing a complete TERS solution with highest sensitivity and spatial resolution.

    For more information, please visit:
    https://www.bruker.com/products/surface-analysis/atomic-force-microscopes/innova-iris/overview.html

  • AUGER ELECTRON SPECTROSCOPY (AES) / SURFACE ANALYSIS / SPECTRAL ANALYSIS
    PHI 710

    Auger Electron Spectroscopy (AES, Auger) is an analytical technique that provides compositional and distributional information of elements on the top few monolayers of a material by irradiating an electron beam to the surface of a solid material and measuring the energy of Auger electron emitted from the sample surface. The PHI 710 Scanning Auger Nanoprobe is a high performance surface analysis system that provides nanometer level Auger analysis. The acoustic enclosure and the built-in vibration isolators allow compositional and distributional measurement by 500,000 magnification that conventional Auger system never achieved.

  • CONFOCAL SOUND ACOUSTIC MICROSCOPE / ELECTRONICS
    C-SAM (AW Series)

    The AW™ Series are advanced high-capacity, high throughput, automated C-SAM® instruments specialized for maximum sensitivity for evaluation of wafer bond applications. The AW Series delivers a better than 5 micron sensitivity, throughputs that are approximately two times faster than competitive systems and non-immersion scanners that eliminate false positives due to DI water ingression. The AW Series automatically handles, inspects and sorts boned wafers based on user-defined accept/reject criteria and are designed to handle wafers bonded by virtually any method, including direct fusion, anodic, glass frit and epoxy bonding.

  • CONFOCAL SOUND ACOUSTIC MICROSCOPE / ELECTRONICS / PRODUCTION
    D24

    The D24™ is a semi-automated factory floor instrument capable of scanning boards and samples up to 24”, or accommodating up to six JEDEC trays of components at one time. The D24 delivers the robustness and accuracy of Sonoscan’s top lab instrument, but with very large area coverage capabilities. Plus, the analysis can be programmed to be performed without operator assistance, freeing your personnel for other duties while the inspection is in progress.

    The D24 accommodates even the largest boards and permits acoustic micro imaging of components mounted on the board. During the initial scan, each component is inspected while the D24 learns the x-y coordinates of each. It also learns the z coordinate and, equally important, the specific internal depth to be scanned. For a flip chip, for example, the level of interest may be the die-to-underfill interface. For a conventional IC package or a BGA, the level of interest may be the die attach. The D24 software can even store gating information for two or more depths of interest per component.

    Because not all components will have the exact same position from board-to-board, the D24 intelligently detects the x, y, and z coordinates and makes minor adjustments as needed, storing a detailed and highly accurate acoustic image of each component. It can also automatically analyze each image. For example, if it detects a void in a die attach layer, software measures the area of the void as a percentage of the whole die attach area. This makes it much easier to comply with standards such as Mil-Std-883, Method 2030, and makes it easier to determine the level of significance of any single defect.

    At the end of the scan, you’ll have a clear ""acoustic picture"" of the board. If there are a few components which should be replaced, you’ll know exactly which components they are, and the reason for rework. If the same component is defective on board after board, the problem can be identified and solved. The result is defect-free output with potentially no reduction in total throughput.

  • CONFOCAL SOUND ACOUSTIC MICROSCOPE / ELECTRONICS / QUALITY CONTROL
    C-SAM (GEN 6)

    The Gen6™ C-Mode Scanning Acoustic Microscope is the newest generation in Acoustic Microscopy Imaging (AMI) innovation. While taking the best from the Gen5™ (e.g. advanced features, aesthetics, and ergonomics), the Gen6 improves upon the rest and takes acoustic imaging to the next level.

    The Gen6 delivers the broadest range of capabilities available. Whether your needs are for nondestructive failure analysis, process development, R&D, High-Rel qualification for a military application, or low/medium-volume screening, the Gen6 is the one C-SAM system that can meet all of your demands. Gen6 is perfect for a variety of applications, such as; Microelectronics, MEMS, SSL LEDs, Power Modules, Solar, High-Tech materials, etc.

    As the ultimate laboratory analysis tool, the Gen6 includes SonoSimulator as a standard feature to simplify the analysis of devices with multiple thin layers.

    Advanced Sonoscan capabilities such as PolyGate™, Virtual Rescanning Mode (VRM™), and available Frequency Domain Imaging (FDI™) add value and confidence. With its large, easy-access, illuminated scanning area, the Gen6 has the capability to efficiently scan everything from a single part, to a 300mm wafer, with its tower referenced scan and fixtures.

    In addition to being packed with leading Sonoscan innovations, the Gen6 was carefully designed with the user in mind. Its ergonomic features make it comfortable and convenient to use. Its advanced applications Sonolytics™ software and new intuitive operator interface menus help maximize results, while saving operator time. Plus, its open access and illuminated tower referenced sample stage allow for easier loading and unloading of samples. The Gen6 is truly the new generation C-SAM, delivering a package of technology, ergonomics, and advanced Sonoscan-developed features that cannot be found anywhere else.

  • CONTACT ANGLE / SURFACE CLEALINESS / WAFER
    VCA Optima

    The VCA Optima series incorporates lightweight design, easy assembly, and the latest Windows™ standards and user-friendly software to create a contact angle instrument that is accurate and easy to use. VCA-optima systems are suitable for research or quality control in R&D and process engineering. Systems range from the basic Optima to the fully equipped Optima XE. Features include Dynamic capture capability, Motorized syringe, Surface energy analysis and Pendant drop analysis, to name a few.
    The VCA Optima utilizes a precision camera and advanced PC technology to capture static or dynamic images of the droplet and determine tangent lines for the basis of contact angle measurement. A manual or automatic syringe provides easy dispensing of test liquid. Computerized operation eliminates human error in line drawing and captures dynamic images for time sensitive analysis. Data and images are stored in the computer for later analysis or easy transfer to other software applications.

  • CONTACT ANGLE / SURFACE CLEALINESS / WAFER
    VCA 3000s

    VCA-3000S Wafer Surface Analysis Systems are specially designed for use in semiconductor wafer processing quality control. The system provides quick and accurate contact angle/surface energy analysis on wafer surface to evaluate adhesion, cleanliness and coatings.

    The syringe mechanism can be raised for easy loading and unloading eliminating the possibility of wafer damage.

    Although the system was designed for wafer surface analysis it is also a useful tool for any application that requires a large stage. Samples sizes up to W12” x L12” x H.75” can easily be accommodated by this system

    The VCA 3000s utilizes a precision camera and advanced PC technology to capture static or dynamic images of the droplet and determine tangent lines for the basis of contact angle measurement. Manual or automatic syringe provides easy dispensing of test liquid. Computerized operation eliminates human error in line drawing and captures dynamic images for time sensitive analysis. Data and images are stored in the computer for later analysis or easy transfer to other software applications.

  • DRY ETCHING SYSTEM
    Dry Etching System

    Dry Decapper ES 312 is the excellent decapsulation system for the resin on electronic components such as IC, LED by Reactive Ion Gas.
    We can promise the Efficient Dry Decapsulation for 3 samples at once by Automatic Matching and N2 gas regular blowing for residue.
    Automatic Operation up to the end of Decap
    Max 3 samples at once
    High Repeatability Etching

  • DUAL BEAM / SEM / FIB
    Versa 3D Dual Beam

    Building on the history and success of FEI's pioneering DualBeam, low vacuum and ESEM™ expertise, FEI introduces the most versatile DualBeam instrument to date. The Versa 3D offers state-of-the-art imaging and analytical performance to deliver a greater range of 3D data from even your most challenging samples.

    Versa 3D's highly configurable platform allows customers to adapt the system's capabilities to their specific requirements. The combination of high and low vacuum modes gives the flexibility to work with a range of samples including uncoated and non-conductive samples. Optional ESEM mode allows electron beam imaging of naturally hydrated samples and supports in situ analysis and experimentation with additional dynamic temperature stages.

  • DUAL BEAM / SEM / FIB / EXTREME HIGH RESOLUTION (XHR)
    Helios Nanolab

    The Helios NanoLab™ DualBeam™ has always combined FEI's best electron and ion optics, accessories and software to deliver a powerful solution for advanced nanoscale research. For scientists working at nanotechnology's leading edge, Helios NanoLab lets them push boundaries and create new possibilities for materials research.

    With highly valued sub-nm SEM imaging, the capability to produce ultra-thin samples for S/TEM, and the most precise prototyping capabilities, scientists choose the Helios NanoLab as their partner for innovating new materials and nanoscale devices that will influence future advancements.

  • DUAL BEAM / SEM / FIB / ULTRA HIGH RESOLUTION (UHR)
    Scios Dual Beam

    FEI Scios™ is an ultra-high-resolution analytical DualBeam™ system that delivers outstanding 2D and 3D performance for a broad range of samples, including magnetic material. With innovative features designed to increase throughput, precision, and ease of use, the FEI Scios is ideal for advanced research and analysis across academic, government, and industrial research environments.

    Advanced detection technology is at the very core of the FEI Scios. In-lens FEI Trinity™ detection technology collects all signals simultaneously, saving time and offering distinctly different contrasts to capture the maximum amount of data. An innovative, under-the-lens concentric backscatter detector enhances efficiency, enabling you to select a signal based on its angular distribution to easily separate materials and topographic contrast-even at 20 eV landing energy.

  • ELECTRIC FAULT ISOLATION / FAILURE ANALYSIS
    Magma EFI HiRes

    Magma EFI HiRes Microscope addresses all static defects: Shorts, Leakages, and Opens.
    3D defect localization calculates the distance from the surface of the sample to the current path when a straight current trace is available.
    Package shorts are a natural fit for Magma microscopes since magnetic fields permeate all materials, e.g. power and ground planes, silicon, molding compounds, etc.
    Die shorts are located using the HiRes sensor with better than 500nm spatial resolution. Magnetic field resolution is NOT limited by wavelength, but only by sensor size and scanning distance.
    Leakages with megohm resistance can be found with 500nA current sensitivity. Typical failures like electromigration and dendrite formation, where high current / high voltage can heal the sample, are readily solvable with Magma microscopes.
    Open failures are found using the new Space Domain Reflectometry (SDR) technique that pulses a high frequency signal (20MHz to 200MHz)while detecting the RF magnetic field. Using this technique on SOC packages with stacked die, TSVs and interposers, open failures in the silicon devices can be localized.

  • Handheld XRF
    Vanta

    The Vanta analyzer is our most advanced handheld X-ray fluorescence (XRF) device and provides rapid, accurate element analysis and alloy identification to customers who demand laboratory-quality results in the field.

    Vanta handheld XRF analyzers are built to be tough. Their rugged and durable design makes them resistant to damage for greater uptime and a lower cost of ownership.

    With intuitive navigation and configurable software, the Vanta series are easy to use with minimal training for high throughput and a fast return on investment. Featuring innovative and proprietary Axon technology, Vanta analyzers give you accurate results and help boost productivity no matter the environment or working conditions.

    Exceptional durability under extreme conditions.
    Analytical superiority.
    Optional Wireless LAN and Bluetooth® for real-time data sharing. Cloud technology enabled.
    Intuitive user interface.

  • Handheld XRF
    Delta Element

    The DELTA Element is the most affordable unit in the Olympus line-up of handheld X-ray fluorescence (XRF) analyzers designed for fast, accurate results. Fast, simple and reliable, the DELTA Element incorporates the features and rugged design of the DELTA family. With fast elemental ID for screening, sorting and metal analysis, the DELTA Element provides fast ROI for Scrap, PMI, QA / QC and Jewelry / Precious Metals applications.

    With a powerful X-ray tube and Si-PIN detector, the DELTA Element is ideal for simple applications. It provides quick ID, screening, sorting and elemental and metal analysis.

    The DELTA Element offers fast measurement with results in seconds, low limits of detection, and outstanding precision.

    The DELTA Element's field-worthy and rugged design features rubber overmolds and an ergonomic grip to protect the analyzer. To avoid downtime, the hot swap feature allows the batteries to be swapped out while the analyzer is in use. The DELTA Element features wide area heat sinks for high power use in extreme temperatures.

    Olympus' exclusive Grade Match Messaging (GMM) feature provides information to simplify verification and streamline operations. Users can assign customized messages to any grade and use real-time or pop-up messages for immediate sorting instructions and improved user efficiency.

  • IN-LINE XRF ANALYZER
    Fox-IQ

    The FOX-IQ in-line analyzer provides customizable, continuous measurements of titanium (Ti) to uranium (U) on any surface. Designed to operate 24/7, the FOX-IQ XRF system performs fully automated in-line analysis for 100% high-volume process control.

    X-ray fluorescence (XRF) is a proven technique used to quickly and nondestructively verify alloy grade and chemistry. The FOX-IQ system is compact and has minimal power requirements, making it easy to integrate with new or existing PLC-controlled processes. The system is engineered to endure high levels of vibration, electromagnetic and acoustical noise, dust, and moisture.

    Each FOX-IQ system delivers pass/fail results, accurate grade identifications, and material chemistry. It can be controlled by a PC or integrated with a PLC for automated start/stop, data acquisition, decision-making, and communication to external devices.

  • IONIC CONTAMINATION TESTER
    CM11

    Commonly referred to ""Cleanliness Testing"" as this test method has, for over 40 years, been acknowledged as an important Quality Assurance and Process Control tool in the manufacture of electronic circuit boards, components and assemblies.

    The Contaminometer (CM Series) test systems were originally developed by Protonique, the business of industry guru Brian Ellis. They also featured in the early development programmes of ""cleanliness measurement"" carried out by the US Department of Defense at China Lake in the 1970s.

    Contaminometers are used to measure the amount of ionic contamination, usually referred to as cleanliness level, in accordance with IPC/ANSI-J-STD001 and UK DEF-STD and other international specifications. The instruments are also commonly referred to as ROSE (Resistivity Of Solvent Extracted) or SEC (Solvent Extract Conductivity) testers.

    CONTAMINOMETERS from Gen3 Systems come in 4 different models and 4 different tank sizes because when selecting a Test System, it is important to use the smallest possible tank size for the circuit under test.

  • LASER CONFOCAL MICROSCOPE / NON-DESTRUCTIVE
    LEXT OLS4100

    The LEXT OLS4100 is a Laser Scanning Microscope to perform non-contact 3D observations and measurements of surface features at 10 nanometer resolutions. It also features a fast image acquisition and a high-resolution image over a wider area.

  • LASER DECAPSULATION SYSTEM
    Laser Decapsulation System

    The Laser IC Opener has released PL101i and PL121i. These models are able to decap Cu wire IC and also perform decapsulation on ultra small packages in constant pursue for improvement in usability. It is possible to upgrade from the current standard type to the new "i" type.

  • OPTICAL MICROCSOPE / INSPECTION MICROSCOPE / WAFER INSPECTION
    MX (Semiconductor & Flat Panel Display Inspection Microscopes)

    Olympus MX microscopes are developed with the concept to offer the highest efficiency for all our customers. MX microscopes ensure beneficial four levels, Fast start-up, Easy Operation, Failure analysis and expandability for users.

  • OPTICAL MICROCSOPE / INSPECTION MICROSCOPE / WAFER INSPECTION
    AL120 (Semiconductor & Flat Panel Display Inspection Microscopes)

    The AL120 wafer handler series transfers both silicon and compound semiconductor wafers from the cassette to the microscope stage with enhanced capabilities and flexibility, while maintaining an ergonomic design.

  • OPTICAL MICROSCOPE / DIGITAL MICROSCOPE / OPTO-DIGITAL MICROPSCOPE
    DSX100

    The DSX100 is a free angle wide zoom microscope with 16x zoom optics for a new generation of inspection and measurements. Employing four segment-LED ring light, this scope ensures high inspection performance.

    The DSX100 provides a new way to see. No need to look through eyepieces, everything you need is on the screen. Operate the scope with a touch panel or mouse. What's more, virtually anyone of any experience level can use this interface to achieve their results in seconds. The system guides the operator from inspection to measurement to analysis to final report. Short, simple steps. Quick results.

  • OPTICAL MICROSCOPE / DIGITAL MICROSCOPE / OPTO-DIGITAL MICROPSCOPE
    DSX500/DSX500i

    The DSX500 is a high-resolution upright motorized microscope with 13x zoom optics. The DSX500 ensures the superior results for any experience level with its superb operating simplicity and absolute performance reliability.

    The DSX500 provides a new way to see. No need to look through eyepieces, everything you need is on the screen. Operate the instrument with touch panel or mouse. What's more, virtually anyone of any experience level can use this new system efficiently. The screen guides the operator through the process, from inspection to measurement to analysis to final report. Short, simple steps. Quick results.

  • OPTICAL MICROSCOPE / HIGH POWER MICROSCOPE
    BX51-P / CX31-P (Polarizing Microscope)

    Olympus Polarizing Microscopes offer superb image quality in polarized light. In combination with versatile polarized accessories, Microscopes become effective tool for material identification, forensic analysis, and variety of materials study.

  • OPTICAL MICROSCOPE / INVERTED METALLURGICAL MICROSCOPE
    GX (Inverted Metallurgical Microscope)

    Olympus GX series Inverted Metallurgical Microscopes are reliable and high performance imaging system with the advanced Olympus UIS2 optics. GX microscopes ensure the high efficiency by the combination with Olympus Imaging Analysis software.

  • OPTICAL MICROSCOPE / MEASURING MICROSCOPE / METROLOGY
    STM7

    The STM7 microscopes offer excellent versatility and high performance three axis measurements of parts and electrical components, with sub-micron precision. Whether samples are small or large, simple or complex, or measurements are being taken by a novice or an expert, the Olympus STM7 range features measuring microscopes tailored to fit your needs.

  • OPTICAL MICROSCOPE / STEREO MICROSCOPE
    SZX / SZ (Stereo Microscope)

    Olympus SZX/SZ Stereo Microscopes offer clear stereoscopic view with comfortable and ergonomic operation. Extensive types of frames with variety of optical options with wide range of zoom support various applications.

  • PLASTIC MOLD DECAPSULATION SYSTEM
    Plastic Mold Decapsulation System

    PS105 is a Plastic Mold Decapsulation System with Precision Acid Auto-Mixing Function. This produces low or no sample damage, low cost and high quality decap.

  • Portable XRD
    Terra

    The TERRA Mobile XRD System, a high performing, completely contained, battery operated, closed-beam portable XRD, provides full phase ID of major, minor and trace components with a qualitative XRF scan of elements Ca - U. Its unique, minimal sample prep technique and sample chamber allow for fast, in-field analysis.

  • REAL-TIME PROBING / NANOPROBE
    Nanoprobing SEM Solutions

    Platforms with mobile robots
    1-8 units
    Driving electronics
    Control software
    Flange with feedthroughsconnectors
    Stage adaptor
    Compatible with most of the SEM
    even with the smallest chambers
    Fast installation/removal of the system: no need for a dedicated SEM
    5-10 min

  • REAL-TIME PROBING / NANOPROBE / COMPACT
    Compact Solution Package

    Their mounting interfaces are compatible with standard optical breadboards and microscope stages,allowing you to easily reconfigure your setup for new experiments. Not directly attached to the sample, these stages are ideal for use at low optical working distance. They are also well adapted to contact large substrates mounted on sample holders that are moved by a positioning stage (e.g. wafer chucks, Petri dishes).

  • REAL-TIME PROBING / NANOPROBE / PORTABLE
    Portable Solution Package

    Versatile. 4 manipulators, 1 platform, multiple microscopes.
    Faster experiments. Observe, prepare and characterize your samples at once.
    Hassle-free probe positioning. Instantly adjust the orientation to any sample geometries.
    High mechanical stability. Move without vibration and maintain steady electrical contacts.

  • SCANNING ACOUSTIC MICROSCOPE / ELECTRONICS
    FastLine™ P300™

    "The FastLine™ P300™ Acoustic Microscope is specifically designed for accelerated inspection throughput in manual screening of microelectronic devices on the manufacturing floor. With an integrated design to minimize footprint, the FastLine is the new platform for Acoustic Microscopes.

    Every detail of the FastLine™ P300™ was engineered to match the way customers use Acoustic Microscopes for non automated production and process control. Simultaneous loading and scanning with Sonoscan’s unique carrier system allows one JEDEC style tray or reference tray to be scanned while a second tray is being safely loaded. The whole inspection process (handling, scanning and analysis) was considered, yielding the highest possible throughput.

    The new, more ergonomic design helps maximize productivity and improves the overall operator experience while minimizing the instrument footprint. FastLine™ P300™’s new Sonolytics™ Operator Interface, designed with the operator in mind, allows technicians to work with simplified and expanded features for production/process use in multiple languages.

    In addition, FastLine™ P300™ features a new electronics platform to meet current and next generation applications. New Movement Map™ technology delivers precise transducer positioning, while the Visual Poly-Gate™ mode allows for simple and instant multiple depth imaging. These innovative features along with the higher speed scanning mechanism make the FastLine™ P300™ system essential for any production line application.
    "

  • SCANNING ACOUSTIC MICROSCOPE / ELECTRONICS
    FACTS² ™

    "The FACTS²™ delivers state-of-the-art, automated in-line inspection for quality and process control. Delivering high throughput with minimal operator interaction, FACTS² simultaneously inspects two trays or modules with precision of ± 0.5 microns and utilizes multiple scan heads, improving throughput between two and seven times that of previous tools.

    FACTS²™ automatically inspects parts in JEDEC trays or Auer Boat carriers as part of an in-line process, ideal for high volume production environments. In addition, the FACTS² can also handle lead frame strips, IGBT power modules, multi-layer ceramic chip capacitors, flip chips and other components. The scanners utilize linear motor drives and mechanisms that virtually eliminate vibration by inertial balancing. Eliminating vibration and sample motion during scans allows for very narrow and precise layers of the samples to be isolated, gated and analyzed. This delivers the industry’s fastest image acquisition times.

    Once inspected, trays are moved to the drying chamber while a new inspection begins. Any previously hidden internal packaging defects, including voids, disbonds, delaminations and cracks, are clearly identified. Batch and lot data can be accessed either as images or tabulated analysis data from spreadsheets and tray maps. If desired, accept/reject criteria can be set to identify defective components within the data automatically. Defects can also be sorted into various categories based on your specific quality standards.

    Equipped with our industry preferred Sonolytics software platform and an SECS-II/GEM E30 interface—allowing for data to be tracked electronically via instrument-to-host communications in your factory environment, the FACTS² delivers the fastest automation inspection with maximum flexibility and is the ideal solution for production environments."

  • SCANNING ACOUSTIC MICROSCOPE / ELECTRONICS
    D9™ Series

    The D9™ Series represents the modern standard for laboratory C-SAM instruments, specializing in failure analysis, process development, material characterization and low volume production inspection. Amply loaded with today's most advanced software, these instruments incorporate robust and accurate scanning features and expansive user conveniences to raise the performance level for laboratory acoustic microscopes. The D9 Series operates in both reflection and transmission modes, ensuring that all types of defects are correctly identified with the highest quality acoustic images available. The D9 Series makes scanning larger samples and trays of samples fast, easy and incredibly accurate.

  • SEM
    Inspect

    With advanced chamber vacuum technology, the Inspect™ line of scanning electron microscopes (SEM) builds on FEI's world-class electron optics and sample throughput technologies. When inspection, characterization, process control and failure analysis are important, the Inspect S50 and Inspect F50 models' high-resolution imaging is a must. The intuitive user interface and software, with all functions required to record and store an image accessed directly via a tool bar, is well suited for a multi-user environment while full stage access to accommodate a range of specimen holders adds value and flexibility for a range of uses.

    The Inspect line of tools includes two scanning electron microscopes , one SEM with tungsten and another SEM with FEG, for use where high-resolution imaging is routine. These cost-effective, flexible, state-of-the-art scanning electron microscopes are built using FEI's advanced technology, making them valuable for industrial manufacturers and researchers working with material characterization and inspection applications.

  • SEM / AUTOMATED
    Aspex

    The Aspex Explorer is a designed for the automated imaging and elemental analysis of a wide spectrum of surfaces and particulate. The Aspex Explorer seamlessly provides high imaging, rapid non-destructive compositional analysis, and robust automation for size, shape and elemental composition.
    The Aspex Explorer is a microanalysis system that provides a fully integrated platform for addressing the micro-scale visualization of key surface features, as well as the needs of a diverse range of industries where stringent cleanliness and particle or inclusion contamination is critical. Its small physical footprint and low cost of ownership make it an ideal solution for operations interested in improving reliability and quality, while also minimizing production inefficiencies.

    A variety of industries from forensics to health sciences, to steel and automotive rely on the rugged hardware and sophisticated software of the Aspex Explorer as a fast and reliable platform for identifying particles as well as surface features.

    The Aspex Explorer with Automated Feature Analysis (AFA), provides a fast, accurate way for manufacturers in many industries to monitor and control the presence of contaminants that affect the quality of their products. For example, automotive parts manufacturers must control the level of particulate contaminants, which can cause failures in the field and impact their warranty programs. Steel makers are concerned with non-metallic inclusions, which degrade steel quality and can clog nozzles in production equipment. Monitoring the number and type of inclusions lets them adjust production chemistry to reduce the number of pour-backs and improve the quality of their products. AFA is valuable whenever rapid feedback of large sets of particle data is needed. The data sets can be trended and reviewed in real-time to identify and correct process issues. The ability to monitor and optimize an industrial process is critical for maximizing production efficiency and cost savings or ultimately, the profitability of the operation.

  • SEM / ENVIRONMENT SEM
    Quanta

    The FEI Quanta line includes six variable-pressure and environmental scanning electron microscopes (ESEM™). All of which can accommodate multiple sample and imaging requirements for industrial process control labs, materials science labs and life science labs.

    The Quanta line of scanning electron microscopes are versatile, high-performance instruments with three modes (high vacuum, low vacuum and ESEM) to accommodate the widest range of samples of any SEM system. All the Quanta SEM systems can be equipped with analytical systems, such as energy dispersive spectrometer, wavelength dispersive x-ray spectroscopy and electron backscatter diffraction. In addition, the field emission gun (FEG) systems contain a S/TEM detector for bright-field and dark-field sample imaging. Another variable that changes amongst the SEM systems is the size of the motorized stage (50mm, 100mm, and 150mm) and the motorized z-range (25mm, 60mm, and 65mm, respectively). The Quanta 650 and 650 FEG are each designed with a roomy chamber, enabling the analysis and navigation of large specimens.

  • SEM / ULTRA HIGH RESOLUTION (UHR)
    Nova Nano

    The Nova NanoSEM™ scanning electron microscope delivers best in class imaging and analytical performance in a single, easy-to-use instrument. Specifically designed to streamline operations in your laboratory, the Nova NanoSEM enables owners the ability to gain the most comprehensive answers in the least amount of time. This propels productivity, without sacrificing on the quality imaging you demand from your daily work.

    With the Nova NanoSEM 50 series, even more becomes possible. In addition to the powerful combination of advanced optics (including a two-mode final lens), SE/BSE (Secondary Electrons/Backscattered Electrons) in-lens detection and beam deceleration, the Nova NanoSEM 50 series introduces a new suite of latest generation, high sensitivity retractable SE/BSE and STEM detectors, as well as versatile SE/BSE filtering capabilities, to best optimize the information of interest. Intelligent scanning modes are available to minimize imaging artifacts.

  • SEM / ULTRA HIGH RESOLUTION (UHR)
    Teneo

    For metals researchers, academic and industrial research institutions, FEI's Teneo SEM provides Ultra High Resolution imaging together with the highest throughput analytical performance.

    A revolution in detection - the unique TrinityTM detection scheme delivers highest contrast on the widest range of samples for fastest imaging and easy interpretation of images. With three separate in-lens detectors operating simultaneously with the standard chamber detector, simultaneous detection from all angles can be performed, saving time, maximizing information and preventing sample contamination and damage.

  • SIMS / ToF
    MiniSims

    The MiniSIMS ToF has a superior level of performance for probing the unknown, investigating smaller surface features and extracting more information from organic samples. The implementation of a time-of flight (ToF) mass spectrometer therefore takes the MiniSIMS concept to a new level of performance by providing spot analysis, imaging, and depth profiling in one compact, easy to use package. The hyperspectral imaging capability of the MiniSIMS-ToF combined with efficient depth profiling allow complete 3D spatial pixel arrays with full or partial mass spectra at every pixel to be acquired. In this way a very comprehensive picture of the surface and sub surface chemistry of solid samples can be acquired with minimal setup and analyzed retrospectively.

  • THICKNESS MEASUREMENT / NON-CONTACT / WAFER
    PROFORMA Series

    MTI Instruments' semiconductor wafer metrology tools consist of a complete line of wafer measurement systems for virtually any material including Silicon wafer (Si), Gallium Arsenide wafer (GaAs), Germanium wafer (Ge) and Indium Phosphide wafer (InP). From manual to semi-automated wafer inspection systems, the Proforma line of wafer metrology inspection tools is ideal for wafer thickness, wafer bow, wafer warp, resistivity, site and global flatness measurement. Our proprietary push/pull capacitance probes provide outstanding accuracy throughout their large measurement range, allowing measurement of highly warped wafers and stacked wafers. MTII's solar metrology tools include off line manual systems for wafer thickness and Total Thickness Variation (TTV), as well as, in-process measurement systems capable of measuring wafer thickness, TTV and wafer bow at the speed of 5 wafers/second.